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QDs PGMEA溶液


星烁PGMEA/光刻胶溶液,由经特殊表面处理的量子点、PGMEA、光刻胶等多种材料精制而成;产品性能稳定,耐受光刻工艺,在高温烘烤和碱性显影下,可保持一定转换效率,且能实现图案化,发射光谱纯度高、光转换效率高、发射光谱范围大、消光系数大、成膜性好、产品种类多、固含量高、兼容多家光刻胶厂商产品及光刻工艺,适用于光刻法制备QD-OLED、QD-mLED、QDCF-LCD等新一代显示器件。


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InP-based QDs PGMEA solution

ColorPL EmissionFWHMQYConcentration450nm AbsEQEAmount Cat NO.
Green 525nm <40nm >70% 10-40%wt OD>0.1/um ~35% 2ml InP-based QDs PGMEA-525-2
Green 525nm <40nm >70% 10-40%wt OD>0.1/um ~35% 5ml InP-based QDs PGMEA-525-5
Green 525nm <40nm >70% 10-40%wt OD>0.1/um ~35% 10nmol InP-based QDs PGMEA-525-10
Red 630nm <45nm >70% 10-40%wt OD>0.2/um ~35% 2nmol InP-based QDs PGMEA-630-2
Red 630nm <45nm >70% 10-40%wt OD>0.2/um ~35% 5nmol InP-based QDs PGMEA-630-5
Red 630nm <45nm >70% 10-40%wt OD>0.2/um ~35% 10nmol InP-based QDs PGMEA-630-10
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Cd-based QDs PGMEA solution

ColorPL EmissionFWHMQYConcentration450nm AbsEQEAmount Cat NO.
Green 525nm <25nm >80% 10-40%wt OD>0.2/um ~45% 2nmol Cd-based QDs PGMEA-525-2
Green 525nm <25nm >80% 10-40%wt OD>0.2/um ~45% 5nmol Cd-based QDs PGMEA-525-5
Green 525nm <25nm >80% 10-40%wt OD>0.2/um ~45% 10nmol Cd-based QDs PGMEA-525-10
Red 630nm <30nm >80% 10-40%wt OD>0.2/um ~50% 2nmol Cd-based QDs PGMEA-630-2
Red 630nm <30nm >80% 10-40%wt OD>0.2/um ~50% 5nmol Cd-based QDs PGMEA-630-5
Red 630nm <30nm >80% 10-40%wt OD>0.2/um ~50% 10nmol Cd-based QDs PGMEA-630-10
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